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Research Article

Analysis of conduction and charging mechanisms in atomic layer deposited multilayered HfO2/Al2O3 stacks for use in charge trapping flash memories

N. Novkovski, Albena Paskaleva, Aleksandar Skeparovski, and Dencho Spassov

Received 29 November 2017; Revised 15 February 2018; Accepted 20 March 2018

Academic Editor: Da-Ren Hang