Tensorial Model for Photolithography Aerial Image Simulation

<table class="table-group" width="800px"><tr class="fig-image" id="a"><td><img alt="457549.fig.006a" src="https://static.hindawi.com/articles/aoe/volume-2009/457549/figures/457549.fig.006a.jpg"/></td></tr><tr class="fig-caption"><td align="center"><table><tr><td><b>(a) </b>Comparison of LRTA and SOCS reconstruction error</td></tr></table></td></tr><tr class="fig-image" id="b"><td><img alt="457549.fig.006b" src="https://static.hindawi.com/articles/aoe/volume-2009/457549/figures/457549.fig.006b.jpg"/></td></tr><tr class="fig-caption"><td align="center"><table><tr><td><b>(b) </b>Comparison between SOCS and LRTA runtime</td></tr></table></td></tr></table>

<table>Comparison between LRTA and SOCS.</table>

Advances in OptoElectronics

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Figure 6

Figure 6: Tensorial Model for Photolithography Aerial Image Simulation 