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ElectroComponent Science and Technology
Volume 5, Issue 3, Pages 159-164

Time Dependence of Ion-Migration Effects in NiCr Resistor Films

1Thin Film Electronics Department, BALZERS AG, Balzers, FL-9496, Liechtenstein
2Sandvik AB, Coromant Factory, Stockholm 42 S-12612, Sweden

Received 4 November 1977; Accepted 27 February 1978

Copyright © 1978 Hindawi Publishing Corporation. This is an open access article distributed under the Creative Commons Attribution License, which permits unrestricted use, distribution, and reproduction in any medium, provided the original work is properly cited.

How to Cite this Article

U. Smith and R. Hoffmann, “Time Dependence of Ion-Migration Effects in NiCr Resistor Films,” ElectroComponent Science and Technology, vol. 5, no. 3, pp. 159-164, 1978.