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ElectroComponent Science and Technology
Volume 7 (1980), Issue 1-3, Pages 159-162
http://dx.doi.org/10.1155/APEC.7.159

Properties of Nickel Films Prepared by R.F. Sputtering and Interdiffusion Analysis of Ta2N–Ni Films

1THOMSON–CSF – Domaine de Corbeville, Orsay 91400, France
2University of Alexandra, Egypt

Received 13 March 1980

Copyright © 1980 Hindawi Publishing Corporation. This is an open access article distributed under the Creative Commons Attribution License, which permits unrestricted use, distribution, and reproduction in any medium, provided the original work is properly cited.

How to Cite this Article

S. Abdin, A. Huber, G. Morillot, and C. Val, “Properties of Nickel Films Prepared by R.F. Sputtering and Interdiffusion Analysis of Ta2N–Ni Films,” ElectroComponent Science and Technology, vol. 7, no. 1-3, pp. 159-162, 1980. doi:10.1155/APEC.7.159