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ElectroComponent Science and Technology
Volume 9 (1981), Issue 2, Pages 111-114

The Influence of the Area of a Thin Film Capacitor on the Breakdown Voltage

Technical University, Wroclaw, Poland

Received 24 June 1980; Accepted 16 November 1980

Copyright © 1981 Hindawi Publishing Corporation. This is an open access article distributed under the Creative Commons Attribution License, which permits unrestricted use, distribution, and reproduction in any medium, provided the original work is properly cited.


The dependence of the breakdown voltage on the capacitor area has been examined by measurements on Al-Al2O3-metal thin film capacitors. The relation of Ub=kA1/c has been found for the breakdown voltage v.s. area; where c is one of the parameters describing the Weibull type of distribution.