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ElectroComponent Science and Technology
Volume 9 (1982), Issue 4, Pages 249-252

The Problems of Selecting a Proper Microlithographic Imaging System

Industrial Research Institute for Electronics, Budapest, Hungary

Received 16 April 1981; Accepted 20 October 1981

Copyright © 1982 Hindawi Publishing Corporation. This is an open access article distributed under the Creative Commons Attribution License, which permits unrestricted use, distribution, and reproduction in any medium, provided the original work is properly cited.


Considering the increased importance of custom integrated circuits in electronic equipments and other products there is a research activity in Hungary to develop a “state-of-the-art” semiconductor development laboratory for technology development and prototype circuit fabrication. The most significant parts of this laboratory are circuit design, mask making and wafer lithography. The problems associated with these three parts are discussed.