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ElectroComponent Science and Technology
Volume 9 (1982), Issue 3, Pages 213-215
Short Communication

The Effect of Sequential Heat Treatment on Resistance and Temperature Coefficient of Resistance (TCR) of NiCr Thin Films

Industrial Institute of Telecommunication, Warsaw, Poland

Received 17 June 1981; Accepted 8 October 1981

Copyright © 1982 Hindawi Publishing Corporation. This is an open access article distributed under the Creative Commons Attribution License, which permits unrestricted use, distribution, and reproduction in any medium, provided the original work is properly cited.


Measurements have been made of resistivity as a function of temperature in the range 290 to 600°K for vacuum deposited NiCr thin films subjected to different heat treatments in air.

While the films prior to heat treatment exhibit a negative TCR in the range 290 to 390°K, after heat treatment the TCR becomes positive and almost constant, in the temperature range 290 to 600°K. The TCR increases when further sequential cycles of heat treatment are applied.