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Active and Passive Electronic Components
Volume 12, Issue 3, Pages 191-200

High Temperature Oxidized SnO2 Films Prepared by Reactive Sputtering

1Institute of Electron Technology of Wroclaw, Technical University, Janiszewskiego 11-17, Wroclaw 50-372, Poland
2High Pressure Research Centre, Polish Academy of Sciences, Sokolowska 29, Warsaw 01-142, Poland

Copyright © 1987 Hindawi Publishing Corporation. This is an open access article distributed under the Creative Commons Attribution License, which permits unrestricted use, distribution, and reproduction in any medium, provided the original work is properly cited.

How to Cite this Article

G. Beensh-Marchwicka, L. Król-Stępniewska, and A. Misiuk, “High Temperature Oxidized SnO2 Films Prepared by Reactive Sputtering,” Active and Passive Electronic Components, vol. 12, no. 3, pp. 191-200, 1987.