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Active and Passive Electronic Components
Volume 23 (2000), Issue 1, Pages 37-51
http://dx.doi.org/10.1155/APEC.23.37

Chemical Etching of {hk0} Silicon Plates in EDP Part I: Experiments and Comparison with TMAH

Laboratoire de Chronométrie, Electronique et Piézoélectricité, Ecole Nationale Supérieure de Mécanique et des Microtechniques, 26 Chemin de l'Epitaphe, Besancon Cedex 25030, France

Received 12 April 2000; Accepted 25 April 2000

Copyright © 2000 Hindawi Publishing Corporation. This is an open access article distributed under the Creative Commons Attribution License, which permits unrestricted use, distribution, and reproduction in any medium, provided the original work is properly cited.

How to Cite this Article

C. R. Tellier, T. G. Leblois, and A. Charbonnieras, “Chemical Etching of {hk0} Silicon Plates in EDP Part I: Experiments and Comparison with TMAH,” Active and Passive Electronic Components, vol. 23, no. 1, pp. 37-51, 2000. doi:10.1155/APEC.23.37