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Active and Passive Electronic Components
Volume 24 (2001), Issue 1, Pages 31-56
http://dx.doi.org/10.1155/2001/80453

Some Investigations on the Anisotropy of the Chemical Etching of (hk0) and (hhl) Silicon Plates in a NaOH 35% Solution. Part I: 2D Etching Shapes

1Laboratoire de Chronométrie Electronique et Piezoélectricité, Ecole Nationale Supérieure de Mécanique et des Microtechniques, 26 chemin de l'Epitaphe, Besançon cédex 25030, France
2lnstitut des Microtechniques de Franche-Comté, Avenue de l'Observatoire, Besançon cédex 25030, France

Received 1 February 2001; Accepted 19 March 2001

Copyright © 2001 Hindawi Publishing Corporation. This is an open access article distributed under the Creative Commons Attribution License, which permits unrestricted use, distribution, and reproduction in any medium, provided the original work is properly cited.

How to Cite this Article

C. A. Hodebourg and C. R. Tellier, “Some Investigations on the Anisotropy of the Chemical Etching of (hk0) and (hhl) Silicon Plates in a NaOH 35% Solution. Part I: 2D Etching Shapes,” Active and Passive Electronic Components, vol. 24, no. 1, pp. 31-56, 2001. doi:10.1155/2001/80453