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Active and Passive Electronic Components
Volume 2007 (2007), Article ID 15754, 5 pages
http://dx.doi.org/10.1155/2007/15754
Research Article

Substrate Effect on Plasma Clean Efficiency in Plasma Enhanced Chemical Vapor Deposition System

1Department of Applied Physics, Graduate Institute of Optoelectronics and Solid State Electronics, National Chiayi University, Chiayi, Taiwan
2Department of Material Science, College of Science and Engineering, National University of Tainan, Tainan, Taiwan

Received 1 June 2007; Accepted 19 November 2007

Academic Editor: Krishnamachar Prasad

Copyright © 2007 Shiu-Ko JangJian and Ying-Lang Wang. This is an open access article distributed under the Creative Commons Attribution License, which permits unrestricted use, distribution, and reproduction in any medium, provided the original work is properly cited.

How to Cite this Article

Shiu-Ko JangJian and Ying-Lang Wang, “Substrate Effect on Plasma Clean Efficiency in Plasma Enhanced Chemical Vapor Deposition System,” Active and Passive Electronic Components, vol. 2007, Article ID 15754, 5 pages, 2007. doi:10.1155/2007/15754