Self-Assembly Investigations of Sulfonated Poly(methyl methacrylate-<i>block</i>-styrene) Diblock Copolymer Thin Films

<div>AFM height images of BCs thermally annealed (TA) at 170°C for 24 h. (a) M3_60/40, (b) M3_60/s40 (<svg height="11.0703pt" id="M35" style="vertical-align:-3.29562pt" version="1.1" viewbox="-0.0498162 -7.77468 9.31822 11.0703" width="9.31822pt" xmlns="http://www.w3.org/2000/svg" xmlns:xlink="http://www.w3.org/1999/xlink"><g transform="matrix(.013,0,0,-0.013,0,0)"><path d="M298 36L289 62C276 55 253 45 228 45C202 45 169 60 169 141V397H276C289 405 292 426 282 437H169V574L155 576L90 509V437H45L17 408L21 397H90V107C90 28 125 -12 188 -12C198 -12 213 -8 230 1L298 36Z"></path></g><g transform="matrix(.0091,0,0,-0.0091,3.965,3.132)"><path d="M262 451C169 451 38 375 38 210C38 98 121 -12 261 -12C360 -12 481 64 481 227C481 351 386 451 262 451ZM249 414C337 414 385 320 385 204C385 70 333 25 272 25C189 25 134 117 134 241C134 355 189 414 249 414Z"></path></g></svg>=71 nm).</div>

Advances in Polymer Technology

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Figure 3

Figure 3: Self-Assembly Investigations of Sulfonated Poly(methyl methacrylate-<i>block</i>-styrene) Diblock Copolymer Thin Films 

Advances in Polymer Technology

Self-Assembly Investigations of Sulfonated Poly(methyl methacrylate-block-styrene) Diblock Copolymer Thin Films

Figure 3