Self-Assembly Investigations of Sulfonated Poly(methyl methacrylate-block-styrene) Diblock Copolymer Thin Films

Figure 4

AFM height images of highly sulfonated samples without any annealing treatment. (a) M2_52/s48 DS of 90% and (b) M2_56/s44 DS of 87%.

(a)

(b)