Analysis of the Release Characteristics of Cu-Treated Antimicrobial Implant Surfaces Using Atomic Absorption Spectrometry

Figure 2

Copper concentration of Cu-PIII-treated Ti6Al4V samples with varying substrate surface roughness (polished, HA blasted, corundum blasted), submersed for 5 days in double-distilled water and 24 h in DMEM at 37°C and 5% CO₂. ANOVA (Post Hoc LSD) test, ^∗𝑃<0.05,^∗∗∗𝑃≤0.001.