[Retracted] The Anatase Phase of Nanotopography Titania with Higher Roughness Has Better Biocompatibility in Osteoblast Cell Morphology and Proliferation

Table 1

Summary of deposition conditions of titania films.

Base pressure	Pa
Working pressures	T3P0V: 3 Pa at a substrate bias of 0 V
	T5P0V: 5 Pa at a substrate bias of 0 V
	T7P0V: 7 Pa at a substrate bias of 0 V
	T5P50V: 5 Pa at a substrate bias of 50 V
	T7P50V: 7 Pa at a substrate bias of 50 V
Deposition time	8 hrs for each sample
RF power	150 W
Argon flow rate	30 sccm
Oxygen flow rate	10 sccm
Target to substrate distance	70 mm
Diameter of silicon (100) substrate	25.4 mm
Diameter of the titanium target	60 mm