Research Article

Effect of the Combination of Restorative Material and the Etching Protocol in Enamel Microleakage in Class II Cavities after Thermocycling

Table 1

Groups, etching protocol, materials, composition, and application technique.

GroupEtching:Materials (abbreviations)CompositionApplication technique

G1Total-etchingFiltek Z350 XT (Z350)Silane-treated ceramics, Bis-GMA, Bis-EMA, silane-treated silica, silane-treated zirconia oxide, dimethacrylate diurethane, polyethylene glycol dimethacrylate, TEGDMA, BHTOblique increments of 2 mm in thickness
G5Self-etching
G2Total-etchingFiltek Z350 XT flow (ZF)Silane-treated ceramics, substitute dimethacrylate, Bis-GMA, silane-treated silica, TEGDMA, ytterbium fluoride, functionalized dimethacrylate polymer, and titanium dioxideOblique increments of 2 mm in thickness
G6Self-etching
G3Total-etchingFiltek One Bulk Fill (FBP)Silane-treated zirconia/silica filler, UDMA, silane-treated zirconia, ytterbium fluoride, DDDMA, silane-treated zirconia, water, AFM-1 monomer, ERGP-DMA, curing agents, stabilizers, dyesIncrements of 5 mm in thickness without conventional resin coating
G7Self-etching
G4Total-etchingFiltek Bulk Fill Flow (FBF)Ceramics treated with silane, UDMA, substituted dimethacrylate, Bis-EMA, ytterbium fluoride, Bis-GMA, benzotriazole, TEGDMA, and ethyl 4-dimethylaminobenzoate.Increments of 4 mm in thickness and coverage with conventional resin
G8Self-etching