Table of Contents Author Guidelines Submit a Manuscript
International Journal of Antennas and Propagation
Volume 2012 (2012), Article ID 823089, 7 pages
http://dx.doi.org/10.1155/2012/823089
Research Article

Optical and Electrical Properties of Magnetron Sputtering Deposited Cu–Al–O Thin Films

1State Key Laboratory of Solidification Processing School of Materials Science and Engineering, Northwestern Polytechnical University, Xi’an 710072, China
2Key Laboratory of Space Applied Physics and Chemistry of Ministry of Education, School of Science, Northwestern Polytechnical University, Xi’an 710129, China

Received 27 May 2012; Accepted 9 July 2012

Academic Editor: Fuli Zhang

Copyright © 2012 Yongjian Zhang et al. This is an open access article distributed under the Creative Commons Attribution License, which permits unrestricted use, distribution, and reproduction in any medium, provided the original work is properly cited.

Linked References

  1. M. H. Ahn, E.-S. Cho, and S. J. Kwon, “Effect of the duty ratio on the indium tin oxide (ITO) film deposited by in-line pulsed DC magnetron sputtering method for resistive touch panel,” Applied Surface Science, vol. 258, no. 3, pp. 1242–1248, 2011. View at Publisher · View at Google Scholar · View at Scopus
  2. M. F. Chen, K. M. Lin, and Y. S. Ho, “Effects of laser-induced recovery process on conductive property of SnO2 : F thin films,” Materials Science and Engineering B, vol. 176, no. 2, pp. 127–131, 2011. View at Publisher · View at Google Scholar · View at Scopus
  3. K. Tonooka, K. Shimokawa, and O. Nishimura, “Properties of copper-aluminum oxide films prepared by solution methods,” Thin Solid Films, vol. 411, no. 1, pp. 129–133, 2002. View at Publisher · View at Google Scholar · View at Scopus
  4. K. Nomura, H. Ohta, K. Ueda, T. Kamiya, M. Hirano, and H. Hosono, “Thin-film transistor fabricated in single-crystalline transparent oxide semiconductor,” Science, vol. 300, no. 5623, pp. 1269–1272, 2003. View at Publisher · View at Google Scholar · View at Scopus
  5. G. Thomas, “Invisible circuits,” Nature, vol. 389, no. 6654, pp. 907–908, 1997. View at Publisher · View at Google Scholar · View at Scopus
  6. H. Kawazoe, M. Yasukawa, H. Hyodo, M. Kurita, H. Yanagi, and H. Hosono, “P-type electrical conduction in transparent thin films of CuAlO2,” Nature, vol. 389, no. 6654, pp. 939–942, 1997. View at Publisher · View at Google Scholar · View at Scopus
  7. S. M. Gao, Y. Zhao, P. Gou, N. Chen, and Y. Xie, “Preparation of CuAlO2 nanocrystalline transparent thin films with high conductivity,” Nanotechnology, vol. 14, no. 5, pp. 538–541, 2003. View at Publisher · View at Google Scholar · View at Scopus
  8. H. Gong, Y. Wang, and Y. Luo, “Nanocrystalline p-type transparent Cu–Al–O semiconductor prepared by chemical-vapor deposition with Cu(acac)2 and Al(acac)3 precursors,” Applied Physics Letters, vol. 76, no. 26, pp. 3959–3961, 2000. View at Google Scholar · View at Scopus
  9. M. Neumann-Spallart, S. P. Pai, and R. Pinto, “PLD growth of CuAlO2,” Thin Solid Films, vol. 515, no. 24, pp. 8641–8644, 2007. View at Publisher · View at Google Scholar · View at Scopus
  10. J. C. Lee, S. Y. Um, Y. W. Heo, J. H. Lee, and J. J. Kim, “Phase development and crystallization of CuAlO2 thin films prepared by pulsed laser deposition,” Journal of the European Ceramic Society, vol. 30, no. 2, pp. 509–512, 2010. View at Publisher · View at Google Scholar · View at Scopus
  11. S. Götzendörfer, C. Polenzky, S. Ulrich, and P. Löbmann, “Preparation of CuAlO2 and CuCrO2 thin films by sol-gel processing,” Thin Solid Films, vol. 518, no. 4, pp. 1153–1156, 2009. View at Publisher · View at Google Scholar · View at Scopus
  12. W. Lan, M. Zhang, G. Dong, P. Dong, Y. Wang, and H. Yan, “The effect of oxygen on the properties of transparent conducting Cu–Al–O thin films deposited by rf magnetron sputtering,” Materials Science and Engineering B, vol. 139, no. 2-3, pp. 155–159, 2007. View at Publisher · View at Google Scholar · View at Scopus
  13. H. Y. Chen and M. W. Tsai, “Delafossite-CuAlO2 films prepared by annealing of amorphous Cu–Al–O films at high temperature under controlled atmosphere,” Thin Solid Films, vol. 519, no. 18, pp. 5966–5970, 2011. View at Publisher · View at Google Scholar · View at Scopus
  14. D. Peters and R. Miethchen, “Symptoms and treatment of hydrogen fluoride injuries,” Journal of Fluorine Chemistry, vol. 79, no. 2, pp. 161–165, 1996. View at Publisher · View at Google Scholar · View at Scopus
  15. E. B. Segal, “First aid for a unique acid, HF: a sequel,” Chemical Health and Safety, vol. 7, no. 1, pp. 18–23, 2000. View at Google Scholar · View at Scopus
  16. J. Cai and H. Gong, “The influence of Cu/Al ratio on properties of chemical-vapor-deposition-grown p-type Cu–Al–O transparent semiconducting films,” Journal of Applied Physics, vol. 98, no. 3, Article ID 033707, 5 pages, 2005. View at Publisher · View at Google Scholar · View at Scopus
  17. B. D. Cullity, Elements of X-Ray Diffraction, Addison Wesley, London, UK, 2nd edition, 1978.
  18. A. S. Reddy, P. S. Reddy, S. Uthanna, and G. M. Rao, “Characterization of CuAlO2 films prepared by dc reactive magnetron sputtering,” Journal of Materials Science, vol. 17, no. 8, pp. 615–620, 2006. View at Publisher · View at Google Scholar · View at Scopus
  19. M. Henyk, D. Wolfframm, and J. Reif, “Ultra short laser pulse induced charged particle emission from wide bandgap crystals,” Applied Surface Science, vol. 168, no. 1–4, pp. 263–266, 2000. View at Publisher · View at Google Scholar · View at Scopus
  20. L. E. Brus, “Electron-electron and electron-hole interactions in small semiconductor crystallites: the size dependence of the lowest excited electronic state,” The Journal of Chemical Physics, vol. 80, no. 9, pp. 4403–4409, 1984. View at Google Scholar · View at Scopus