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International Journal of Corrosion
Volume 2014, Article ID 565109, 8 pages
http://dx.doi.org/10.1155/2014/565109
Research Article

Effect of C/Si Ratio on the Electrochemical Behavior of a-SiCx:H Coatings on SS301 Substrate Deposited by PECVD

1Department of Mining and Materials Engineering, McGill University, 3610 University Street, Montreal, QC, Canada H3A 2B2
2Department of Engineering Physics, Ecole Polytechnique, C.P. 6079, Succ. Centre Ville, Montreal, QC, Canada H3C 3A7

Received 25 November 2013; Revised 19 January 2014; Accepted 20 January 2014; Published 5 March 2014

Academic Editor: Flavio Deflorian

Copyright © 2014 D. Li et al. This is an open access article distributed under the Creative Commons Attribution License, which permits unrestricted use, distribution, and reproduction in any medium, provided the original work is properly cited.

How to Cite this Article

D. Li, S. Guruvenket, J. A. Szpunar, and J. E. Klemberg-Sapieha, “Effect of C/Si Ratio on the Electrochemical Behavior of a-SiCx:H Coatings on SS301 Substrate Deposited by PECVD,” International Journal of Corrosion, vol. 2014, Article ID 565109, 8 pages, 2014. https://doi.org/10.1155/2014/565109.