Effect of C/Si Ratio on the Electrochemical Behavior of a-SiC<sub><i>x</i></sub>:H Coatings on SS301 Substrate Deposited by PECVD

<table>(a) Cross-sectional SEM image of a-SiC<sub>1.02</sub>:H coating; (b) SEM images of (b1) a-SiC<sub>0.59</sub>:H, (b2) a-SiC<sub>0.75</sub>:H, (b3) a-SiC<sub>0.89</sub>:H, and (b4) a-SiC<sub>1.02</sub>:H coatings.</table>

International Journal of Corrosion

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Figure 2

Figure 2: Effect of C/Si Ratio on the Electrochemical Behavior of a-SiC<sub><i>x</i></sub>:H Coatings on SS301 Substrate Deposited by PECVD 

International Journal of Corrosion

Effect of C/Si Ratio on the Electrochemical Behavior of a-SiCx:H Coatings on SS301 Substrate Deposited by PECVD

Figure 2

Effect of C/Si Ratio on the Electrochemical Behavior of a-SiC_x:H Coatings on SS301 Substrate Deposited by PECVD