Effect of C/Si Ratio on the Electrochemical Behavior of a-SiC<sub><i>x</i></sub>:H Coatings on SS301 Substrate Deposited by PECVD

<table>Potentiodynamic polarization curves of a-SiC<sub><i>x</i></sub>:H coatings and SS301 substrate.</table>

International Journal of Corrosion

Figure 5: Effect of C/Si Ratio on the Electrochemical Behavior of a-SiC<sub><i>x</i></sub>:H Coatings on SS301 Substrate Deposited by PECVD 