Effect of C/Si Ratio on the Electrochemical Behavior of a-SiC<sub><i>x</i></sub>:H Coatings on SS301 Substrate Deposited by PECVD

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</svg> derived from the potentiodynamic polarization curves.</table>

International Journal of Corrosion

fig6

Figure 6

Figure 6: Effect of C/Si Ratio on the Electrochemical Behavior of a-SiC<sub><i>x</i></sub>:H Coatings on SS301 Substrate Deposited by PECVD 

International Journal of Corrosion

Effect of C/Si Ratio on the Electrochemical Behavior of a-SiCx:H Coatings on SS301 Substrate Deposited by PECVD

Figure 6

Effect of C/Si Ratio on the Electrochemical Behavior of a-SiC_x:H Coatings on SS301 Substrate Deposited by PECVD