Effect of C/Si Ratio on the Electrochemical Behavior of a-SiC<sub><i>x</i></sub>:H Coatings on SS301 Substrate Deposited by PECVD

<table>Resistance to charge transfer of the bare SS301 substrate and the a-SiC<sub><i>x</i></sub>:H coatings with different C contents.</table>

International Journal of Corrosion

Figure 8: Effect of C/Si Ratio on the Electrochemical Behavior of a-SiC<sub><i>x</i></sub>:H Coatings on SS301 Substrate Deposited by PECVD 