Effect of C/Si Ratio on the Electrochemical Behavior of a-SiC_x:H Coatings on SS301 Substrate Deposited by PECVD

Table 2

The best-fit values of EIS spectra of SS301 and a-SiC_x:H samples.

Sample	𝑅𝑠 (Ω cm^2)	𝑄𝑓(𝑌0) (F/cm^2)	𝑄𝑓(𝑛)	𝑅𝑝 (Ω cm^2)	𝑄dl(𝑌0) (F/cm^2)	𝑄dl(𝑛)	𝑅ct (Ω cm^2)
SS301	57	—	—	—	2.8×10^−5	0.907	1.37×10^6
a-SiC0.59:H	44	5.1×10^−9	0.962	8.84×10^4	1.0×10^−8	0.593	2.99×10^8
a-SiC0.75:H	42	6.6×10^−9	0.966	1.29×10^5	6.7×10^−8	0.613	2.19×10^9
a-SiC0.89:H	51	6.8×10^−9	0.946	5.36×10^8	2.2×10^−9	0.608	3.35×10^9
a-SiC1.02:H	46	9.7×10^−11	0.991	2.69×10^9	7.0×10^−11	0.506	1.05×10^10