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International Journal of Chemical Engineering
Volume 2012, Article ID 329419, 9 pages
http://dx.doi.org/10.1155/2012/329419
Research Article

Gas-Solid Reaction Properties of Fluorine Compounds and Solid Adsorbents for Off-Gas Treatment from Semiconductor Facility

1Nagoya Institute of Technology, Gokiso-cho, Showa-ku, Nagoya 466-8555, Japan
2Iwatani Corporation, 4-5-1 Katsube, Moriyama-shi, Shiga 524-0041, Japan
3Chubu Electric Power Co., Inc., 20-1 Kitasekiyama, Odaka-cho, Midori-ku, Nagoya 459-8522, Japan

Received 23 March 2012; Accepted 19 June 2012

Academic Editor: Annabelle Couvert

Copyright © 2012 Shinji Yasui et al. This is an open access article distributed under the Creative Commons Attribution License, which permits unrestricted use, distribution, and reproduction in any medium, provided the original work is properly cited.

Abstract

We have been developing a new dry-type off-gas treatment system for recycling fluorine from perfluoro compounds present in off-gases from the semiconductor industry. The feature of this system is to adsorb the fluorine compounds in the exhaust gases from the decomposition furnace by using two types of solid adsorbents: the calcium carbonate in the upper layer adsorbs HF and converts it to CaF2, and the sodium bicarbonate in the lower layer adsorbs HF and SiF4 and converts them to Na2SiF6. This paper describes the fluorine compound adsorption properties of both the solid adsorbents—calcium carbonate and the sodium compound—for the optimal design of the fixation furnace. An analysis of the gas-solid reaction rate was performed from the experimental results of the breakthrough curve by using a fixed-bed reaction model, and the reaction rate constants and adsorption capacity were obtained for achieving an optimal process design.