Gas-Solid Reaction Properties of Fluorine Compounds and Solid Adsorbents for Off-Gas Treatment from Semiconductor Facility

<table class="table-group" width="800px"><tr class="fig-image" id="a"><td><img alt="329419.fig.008a" src="https://static.hindawi.com/articles/ijce/volume-2012/329419/figures/329419.fig.008a.jpg"/></td></tr><tr class="fig-caption"><td align="center"><table><tr><td><b>(a) </b> Grain size: 1-2 mm</td></tr></table></td></tr><tr class="fig-image" id="b"><td><img alt="329419.fig.008b" src="https://static.hindawi.com/articles/ijce/volume-2012/329419/figures/329419.fig.008b.jpg"/></td></tr><tr class="fig-caption"><td align="center"><table><tr><td><b>(b) </b>Grain size: 2–5 mm</td></tr></table></td></tr></table>

<table>Reaction rate of CaCO<sub>3</sub> plotted against the HF concentration.</table>

International Journal of Chemical Engineering

fig8

Figure 8

Figure 8: Gas-Solid Reaction Properties of Fluorine Compounds and Solid Adsorbents for Off-Gas Treatment from Semiconductor Facility 