Gas-Solid Reaction Properties of Fluorine Compounds and Solid Adsorbents for Off-Gas Treatment from Semiconductor Facility

<div class="floats-full-page floats-full-page-figure"><h2>Figure 9</h2><div class="floats-full-page-caption"><table>Plots of (<i>dX</i>/<i>dt</i>)<sup>−1</sup> · <svg height="15.5375" id="M28" style="vertical-align:-3.276pt" version="1.1" viewbox="0 0 28.137501 15.5375" width="28.137501" xmlns="http://www.w3.org/2000/svg" xmlns:xlink="http://www.w3.org/1999/xlink">
<g transform="matrix(.017,0,0,-.017,.062,11.4)"><path d="M682 629q-1 -16 -1.5 -72t-2.5 -86l-31 -4q-5 92 -51 129t-139 37q-100 0 -177 -49t-116 -125t-39 -162q0 -122 66 -201t182 -79q83 0 137 42.5t112 128.5l26 -15q-12 -31 -42.5 -88t-45.5 -75q-139 -27 -199 -27q-148 0 -243 81.5t-95 226.5q0 173 129.5 274.5&#13;&#10;t325.5 101.5q114 0 204 -38z" id="x1D436"></path></g>
<g transform="matrix(.012,0,0,-.012,12.05,15.475)"><path d="M729 650v-28q-62 -5 -76 -19.5t-14 -75.5v-404q0 -62 13.5 -76t75.5 -19v-28h-268v28q65 5 79.5 19t14.5 76v199h-341v-199q0 -62 14 -76t76 -19v-28h-263v28q61 5 74.5 19t13.5 76v404q0 62 -14 76t-76 19v28h259v-28q-58 -5 -71 -19t-13 -76v-162h341v162&#13;&#10;q0 61 -13.5 75.5t-72.5 19.5v28h261z" id="x48"></path></g><g transform="matrix(.012,0,0,-.012,21.164,15.475)"><path d="M493 503l-29 -4q-13 56 -28 80q-13 22 -35.5 29.5t-78.5 7.5h-76q-22 0 -27.5 -5t-5.5 -27v-238h103q66 0 82.5 12t25.5 62h29v-193h-29q-9 54 -25.5 67t-82.5 13h-103v-181q0 -64 15 -78.5t84 -19.5v-28h-272v28q61 5 74.5 19.5t13.5 78.5v399q0 64 -13 78t-72 19v28&#13;&#10;h440q1 -40 10 -147z" id="x46"></path></g>
</svg> versus (1−<i>X</i>)<sup>−1/3</sup>−1.</table></div><div class="floats-full-page-content"><table class="table-group" width="800px"><tr class="fig-image" id="a"><td><img alt="329419.fig.009a" src="https://static-01.hindawi.com/articles/ijce/volume-2012/329419/figures/329419.fig.009a.jpg" /></td></tr><tr class="fig-caption"><td align="center"><table><tr><td><b>(a) </b>Grain size: 1-2 mm</td></tr></table></td></tr><tr class="fig-image" id="b"><td><img alt="329419.fig.009b" src="https://static-01.hindawi.com/articles/ijce/volume-2012/329419/figures/329419.fig.009b.jpg" /></td></tr><tr class="fig-caption"><td align="center"><table><tr><td><b>(b) </b>Grain size: 2–5 mm</td></tr></table></td></tr></table></div></div>

Figure 9 | Gas-Solid Reaction Properties of Fluorine Compounds and Solid Adsorbents for Off-Gas Treatment from Semiconductor Facility

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Figure 9: Gas-Solid Reaction Properties of Fluorine Compounds and Solid Adsorbents for Off-Gas Treatment from Semiconductor Facility

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Figure 9

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<p><em>International Journal of Chemical Engineering</em> publishes research focused on technologies for the production, processing, transportation and use of chemicals on an industrial scale.</p>


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<p>Chief Editor, Evangelos Tsotsas, holds the Chair of Thermal Process Engineering at Otto von Guericke University Magdeburg (Germany) since 1994. The main focus of his work is on drying, and on particle formulation processes related to drying, such as spray fluidized bed agglomeration.</p>


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