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International Journal of Electrochemistry
Volume 2011 (2011), Article ID 173462, 8 pages
Research Article

Electrochemical Study on Corrosion Inhibition of Copper in Hydrochloric Acid Medium and the Rotating Ring-Disc Voltammetry for Studying the Dissolution

Analytical Chemistry Division, Bhabha Atomic Research Centre, Mumbai 400085, India

Received 5 July 2010; Revised 22 October 2010; Accepted 3 January 2011

Academic Editor: Mohamed Mohamedi

Copyright © 2011 A. K. Satpati and A. V. R. Reddy. This is an open access article distributed under the Creative Commons Attribution License, which permits unrestricted use, distribution, and reproduction in any medium, provided the original work is properly cited.


Dissolution characteristics of copper in hydrochloric acid medium and the effect of 4-amino 1,2,4-triazole (ATA) on the corrosion process have been studied using conventional electrochemical techniques and rotating ring-disc electrodes (RRDEs). Corrosion potential ( 𝐸 c o r r ) and corrosion current density ( 𝐼 c o r r ) were obtained by Tafel extrapolation methods. Charge transfer resistance ( 𝑅 c t ) and double-layer capacitance ( 𝐶 d l ) were obtained from the electrochemical impedance spectroscopy (EIS). ATA was shown to be an effective inhibitor for the copper-corrosion inhibition in acid medium. The corrosion rate was retarded in presence of inhibitors mainly because of the adsorption of the inhibitor on the electrode surface. Adsorption of the inhibitor on the metal surface was found to follow the Langmuir adsorption isotherm. Standard free energy change of the adsorption process ( Δ 𝐺 0 a d ) was calculated to be −54.3 kJ mol−1; such a large negative value of Δ 𝐺 0 a d suggests the prescence of a chemisorption process.