Electrochemical Study on Corrosion Inhibition of Copper in Hydrochloric Acid Medium and the Rotating Ring-Disc Voltammetry for Studying the Dissolution

<table>Polarization plots of copper in 0.5-M HCl with and without different concentrations of ATA, without ATA, (1); with 0.1-mM ATA; (2); with 1-mM ATA, (3); with 10-mM ATA, (4).</table>

International Journal of Electrochemistry

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Figure 1

Figure 1: Electrochemical Study on Corrosion Inhibition of Copper in Hydrochloric Acid Medium and the Rotating Ring-Disc Voltammetry for Studying the Dissolution 

Figure 1 | Electrochemical Study on Corrosion Inhibition of Copper in Hydrochloric Acid Medium and the Rotating Ring-Disc Voltammetry for Studying the Dissolution 