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International Journal of Electrochemistry
Volume 2011 (2011), Article ID 479203, 8 pages
http://dx.doi.org/10.4061/2011/479203
Research Article

Fabricating Pinhole-Free YSZ Sub-Microthin Films by Magnetron Sputtering for Micro-SOFCs

Department of Mechanical and Materials Engineering, Wright State University, Dayton, OH 45435, USA

Received 2 September 2010; Revised 19 October 2010; Accepted 2 November 2010

Academic Editor: Boniface Kokoh

Copyright © 2011 T. Hill and H. Huang. This is an open access article distributed under the Creative Commons Attribution License, which permits unrestricted use, distribution, and reproduction in any medium, provided the original work is properly cited.

How to Cite this Article

T. Hill and H. Huang, “Fabricating Pinhole-Free YSZ Sub-Microthin Films by Magnetron Sputtering for Micro-SOFCs,” International Journal of Electrochemistry, vol. 2011, Article ID 479203, 8 pages, 2011. doi:10.4061/2011/479203