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International Journal of Electrochemistry
Volume 2013 (2013), Article ID 138419, 7 pages
Research Article

Simple Formation of Nanostructured Molybdenum Disulfide Thin Films by Electrodeposition

1Materials Processing Division, Bhabha Atomic Research Centre, Trombay, Mumbai 400 085, India
2Radiation and Photochemistry Division, Bhabha Atomic Research Centre, Trombay, Mumbai 400 085, India
3Department of Metallurgy and Materials, Katholic University of Leuven, 3001 Leuven, Belgium

Received 30 April 2013; Accepted 18 July 2013

Academic Editor: Emmanuel Maisonhaute

Copyright © 2013 S. K. Ghosh et al. This is an open access article distributed under the Creative Commons Attribution License, which permits unrestricted use, distribution, and reproduction in any medium, provided the original work is properly cited.


Nanostructured molybdenum disulfide thin films were deposited on various substrates by direct current (DC) electrolysis form aqueous electrolyte containing molybdate and sulfide ions. Post deposition annealing at higher temperatures in the range 450–700°C transformed the as-deposited amorphous films to nanocrystalline structure. High temperature X-ray diffraction studies clearly recorded the crystal structure transformations associated with grain growth with increase in annealing temperature. Surface morphology investigations revealed featureless structure in case of as-deposited surface; upon annealing it converts into a surface with protruding nanotubes, nanorods, or dumbbell shape nanofeatures. UV-visible and FTIR spectra confirmed about the presence of Mo-S bonding in the deposited films. Transmission electron microscopic examination showed that the annealed MoS2 films consist of nanoballs, nanoribbons, and multiple wall nanotubes.