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International Journal of Electrochemistry
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International Journal of Electrochemistry
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2013
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Article
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Tab 1
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Research Article
Simple Formation of Nanostructured Molybdenum Disulfide Thin Films by Electrodeposition
Table 1
Dependence of MoS
2
thin film thickness on deposition time and heat treatment.
Deposition time (min.)
As-deposited film
thickness (nm)
Annealed film
thickness (nm)
3
404
223
4
511
341