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International Journal of Optics
Volume 2012, Article ID 238367, 7 pages
http://dx.doi.org/10.1155/2012/238367
Research Article

Polishing Sapphire Substrates by 355 nm Ultraviolet Laser

School of Electromechanical Engineering, Guangdong University of Technology, Guangzhou 510090, China

Received 15 February 2012; Revised 21 May 2012; Accepted 29 May 2012

Academic Editor: Jian Xu

Copyright © 2012 X. Wei et al. This is an open access article distributed under the Creative Commons Attribution License, which permits unrestricted use, distribution, and reproduction in any medium, provided the original work is properly cited.

Abstract

This paper tries to investigate a novel polishing technology with high efficiency and nice surface quality for sapphire crystal that has high hardness, wear resistance, and chemical stability. A Q-switched 355 nm ultraviolet laser with nanosecond pulses was set up and used to polish sapphire substrate in different conditions in this paper. Surface roughness of polished sapphire was measured with surface profiler, and the surface topography was observed with scanning electronic microscope. The effects of processing parameters as laser energy, pulse repetition rate, scanning speed, incident angle, scanning patterns, and initial surface conditions on surface roughness were analyzed.