Preparation and Characterization of (Au/n-Sn<svg     style="vertical-align:-4.32007pt;width:25.025px;" id="M1" height="20.4125" version="1.1" viewBox="0 0 25.025 20.4125" width="25.025"  xmlns:xlink="http://www.w3.org/1999/xlink" xmlns="http://www.w3.org/2000/svg">
	
		
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</svg>/Si<svg     style="vertical-align:-4.32007pt;width:25.025px;" id="M2" height="20.4125" version="1.1" viewBox="0 0 25.025 20.4125" width="25.025"  xmlns:xlink="http://www.w3.org/1999/xlink" xmlns="http://www.w3.org/2000/svg">
	
		
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			<g transform="matrix(.016,-0,0,-.016,16.813,20.35)"><use xlink:href="#x32"/></g>

		
	
</svg>/Si/Al) MIS Device for Optoelectronic Application

<table>Rapid photothermal oxidation (R.T.O) setup.</table>

International Journal of Optics

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Figure 2

Figure 2: Preparation and Characterization of (Au/n-Sn<svg     style="vertical-align:-4.32007pt;width:25.025px;" id="M1" height="20.4125" version="1.1" viewBox="0 0 25.025 20.4125" width="25.025"  xmlns:xlink="http://www.w3.org/1999/xlink" xmlns="http://www.w3.org/2000/svg">
	
		
			<g transform="matrix(.022,-0,0,-.022,.062,14.975)"><path id="x4F" d="M381 665q131 0 226.5 -93t95.5 -239q0 -158 -96 -253t-238 -95q-137 0 -231 95t-94 238q0 142 92.5 244.5t244.5 102.5zM359 629q-89 0 -151 -74.5t-62 -208.5q0 -141 69 -233t175 -92q90 0 150.5 74t60.5 211q0 152 -69 237.5t-173 85.5z" /></g>

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</svg>/Si<svg     style="vertical-align:-4.32007pt;width:25.025px;" id="M2" height="20.4125" version="1.1" viewBox="0 0 25.025 20.4125" width="25.025"  xmlns:xlink="http://www.w3.org/1999/xlink" xmlns="http://www.w3.org/2000/svg">
	
		
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			<g transform="matrix(.016,-0,0,-.016,16.813,20.35)"><use xlink:href="#x32"/></g>

		
	
</svg>/Si/Al) MIS Device for Optoelectronic Application 

International Journal of Optics

Preparation and Characterization of (Au/n-Sn /Si /Si/Al) MIS Device for Optoelectronic Application

Figure 2

Preparation and Characterization of (Au/n-Sn/Si/Si/Al) MIS Device for Optoelectronic Application