Research Article
Preparation and Properties of SnO2 Film Deposited by Magnetron Sputtering
Table 1
Film thickness, surface roughness, and particle size of SnO2 films deposited with different conditions.
| Oxygen partial pressure percentage (%) | Deposition time (min) | Thickness (nm) | RMS (nm) | Particle size (nm) |
| 0 | 20 | 62 | 0.612 | 0.8 | 60 | 148 | 1.2 | 2.4 |
| 3 | 60 | 55 | — | — | 110 | 87 | — | — |
| 5 | 30 | 50 | — | — | 60 | 58 | — | — | 110 | 70 | — | — |
| 10 | 60 | 30 | 0.608 | 1.4 | 135 | 50 | 0.56 | 1.2 |
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