Modelling of Light Trapping in Acidic-Textured Multicrystalline Silicon Wafers

Figure 7

Scanning electron microscope images of the surface and cross sections of multicrystalline silicon wafer surfaces textured under two different conditions: (a,b) HF : HNO₃ : H₂O = 15 : 50 : 35, 25°C, 2 min; (c,d) HF : HNO₃ : H₂O = 24 : 40 : 36, 10°C, 2 min.

(a)

(b)

(c)

(d)