Microcrystalline-Silicon-Oxide-Based N-Type Reflector Structure in Micromorph Tandem Solar Cells

Figure 4

TEM bright field images (a) and dark field images (b) of n-μc-SiO_𝑥:H thin films deposited on glass substrates (100 KX). The dark field image is taken by the Si (111) diffraction (c); TEM bright field images of a-Si/μc-Si tandem cells (25 KX); (d) HRTEM images of the N-reflector (n-μc-SiO_𝑥 thin films, 800 KX).

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