Nanostructural, Chemical, and Mechanical Features of nc-Si:H Films Prepared by PECVD

Table 2

Variation in the chemical and physical features of the nc-Si:H thin films with deposition time.

Deposition time (min)	Film thickness (nm)	𝑑XRD^∗ (nm)	𝑑RamanS.^∗∗ (nm)	Crystal volume fraction (%)	Monohydride volume fraction (%)	Elastic modulus (Gpa)
10	85	—	—	—	2.7	157
30	260	5.8	6.9	7.5	11.8	135
60	490	6.2	7.3	8.0	28.4	141
180	1780	7.4	7.9	17.7	50.8	144
360	4150	8.1	8.5	45.0	74.5	147

* 𝑑_XRD: crystal size measured by XRD.
** 𝑑_RamanS.: crystal size measured by Raman Spectroscopy.