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International Journal of Photoenergy
Volume 2012, Article ID 697653, 6 pages
http://dx.doi.org/10.1155/2012/697653
Research Article

Gas Nozzle Effect on the Deposition of Polysilicon by Monosilane Siemens Reactor

Technical R&D Center, Semi-Materials Co., Ltd., Youngcheon, Gyeongbuk 770-803, Republic of Korea

Received 31 August 2011; Accepted 15 December 2011

Academic Editor: Bhushan Sopori

Copyright © 2012 Seung Oh Kang et al. This is an open access article distributed under the Creative Commons Attribution License, which permits unrestricted use, distribution, and reproduction in any medium, provided the original work is properly cited.

Abstract

Deposition of polysilicon (poly-Si) was tried to increase productivity of poly-Si by using two different types of gas nozzle in a monosilane Bell-jar Siemens (MS-Siemens) reactor. In a mass production of poly-Si, deposition rate and energy consumption are very important factors because they are main performance indicators of Siemens reactor and they are directly related with the production cost of poly-Si. Type A and B nozzles were used for investigating gas nozzle effect on the deposition of poly-Si in a MS-Siemens reactor. Nozzle design was analyzed by computation cluid dynamics (CFD). Deposition rate and energy consumption of poly-Si were increased when the type B nozzle was used. The highest deposition rate was 1 mm/h, and the lowest energy consumption was −1 in this study.