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International Journal of Photoenergy
Volume 2012, Article ID 697653, 6 pages
http://dx.doi.org/10.1155/2012/697653
Research Article

Gas Nozzle Effect on the Deposition of Polysilicon by Monosilane Siemens Reactor

Technical R&D Center, Semi-Materials Co., Ltd., Youngcheon, Gyeongbuk 770-803, Republic of Korea

Received 31 August 2011; Accepted 15 December 2011

Academic Editor: Bhushan Sopori

Copyright © 2012 Seung Oh Kang et al. This is an open access article distributed under the Creative Commons Attribution License, which permits unrestricted use, distribution, and reproduction in any medium, provided the original work is properly cited.

How to Cite this Article

Seung Oh Kang, Uk June Lee, Seung Hyun Kim, et al., “Gas Nozzle Effect on the Deposition of Polysilicon by Monosilane Siemens Reactor,” International Journal of Photoenergy, vol. 2012, Article ID 697653, 6 pages, 2012. https://doi.org/10.1155/2012/697653.