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International Journal of Photoenergy
Volume 2012 (2012), Article ID 767054, 12 pages
Research Article

TiO2:(Fe, S) Thin Films Prepared from Complex Precursors by CVD, Physical Chemical Properties, and Photocatalysis

1FCT, Universidade do Algarve, Campus de Gambelas, 8005-117 Faro, Portugal
2CQFM and IN, IST, Universidade Técnica de Lisboa, 1049-001 Lisboa, Portugal
3Informatics and Electrotechnics, University of Rostock, 18055 Rostock, Germany
4Institute of Physics, University of Rostock, 18055 Rostock, Germany

Received 17 October 2011; Accepted 30 November 2011

Academic Editor: Jiaguo Yu

Copyright © 2012 V. G. Bessergenev et al. This is an open access article distributed under the Creative Commons Attribution License, which permits unrestricted use, distribution, and reproduction in any medium, provided the original work is properly cited.


The TiO2 thin films were prepared using Ti(dpm)2( O P r i )2 and Ti( O P r i )4 (dpm = 2,2,6,6-tetramethylheptane-3,5-dione, P r i = isopropyl) as the precursors. The volatile compounds Fe[(C2H5)2NCS2]3 and [(CH3)C]2S2 were used to prepare doped TiO2 films. The synthesis was done in vacuum or in the presence of Ar and O2. The pressure in the CVD chamber was varied between 1 . 2 × 1 0 4 mbar and 0.1 mbar, with the system working either in the molecular beam or gas flow regime. Physical, chemical, and photocatalytic properties of the (Fe, S)-doped TiO2 films were studied. Those TiO2:(Fe, S) films prepared from the Ti( O P r i )4 precursor show increased photocatalytic activities, very close to those of Degussa P25 powder in UV region.