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International Journal of Photoenergy
Volume 2012, Article ID 872576, 21 pages
http://dx.doi.org/10.1155/2012/872576
Review Article

Silicon Nanoscale Materials: From Theoretical Simulations to Photonic Applications

1Department of Chemistry, University of Helsinki, P.O. Box 55, 00014 Helsinki, Finland
2Dipartimento di Scienze e Metodi dell'Ingegneria, Università di Modena e Reggio Emilia, Via Amendola, 2 Pad. Morselli, 42122 Reggio nell'Emilia, Italy
3MATIS IMM CNR, Via Santa Sofia 64, 95123 Catania, Italy
4CIMAP, CNRS/CEA/ENSICAEN/UCBN, 6 boulevard Maréchal Juin, 14050 Caen Cedex 4, France

Received 18 December 2011; Revised 13 March 2012; Accepted 13 March 2012

Academic Editor: David Lee Phillips

Copyright © 2012 Leonid Khriachtchev et al. This is an open access article distributed under the Creative Commons Attribution License, which permits unrestricted use, distribution, and reproduction in any medium, provided the original work is properly cited.

How to Cite this Article

Leonid Khriachtchev, Stefano Ossicini, Fabio Iacona, and Fabrice Gourbilleau, “Silicon Nanoscale Materials: From Theoretical Simulations to Photonic Applications,” International Journal of Photoenergy, vol. 2012, Article ID 872576, 21 pages, 2012. https://doi.org/10.1155/2012/872576.