Prepared and Characteristics of ZnO:YAG/Silicon Nanostructure Diodes Prepared by Ultrasonic Spraying

Figure 1

FESEM micrographs of the ZnO:YAG films (YAG phosphor at 5 wt%) with various deposition times: (a) 20 min, (b) 40 min, and (c) 60 min.

(a)

(b)

(c)