Long Wavelength Plasmonic Absorption Enhancement in Silicon Using Optical Lithography Compatible Core-Shell-Type Nanowires

Figure 2

Suggested fabrication sequence for half-shell nanowires. (a) Lithography, (b) etching, (c) metal deposition, and (d) a half-shell nanowire after lift-off and silicon deposition.

(a)

(b)

(c)

(d)