International Journal of Photoenergy / 2014 / Article / Tab 2

Research Article

Expanding Thermal Plasma Chemical Vapour Deposition of ZnO:Al Layers for CIGS Solar Cells

Table 2

Structure of CIGS solar cell, with the deposition procedures and film thicknesses included for each layer.

LayerThicknessDeposition method

ZnO:Al100–800 nmETP-CVD (reference: RF sputtering)
i-ZnO50 nmRF sputtering
CdS35 nmChemical bath deposition
CIGS2  mCoevaporation
Mo300–400 nmSputtering
Soda-lime glass1 mm

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