Expanding Thermal Plasma Chemical Vapour Deposition of ZnO:Al Layers for CIGS Solar Cells

Table 2

Structure of CIGS solar cell, with the deposition procedures and film thicknesses included for each layer.

Layer	Thickness	Deposition method
ZnO:Al	100–800 nm	ETP-CVD (reference: RF sputtering)
i-ZnO	50 nm	RF sputtering
CdS	35 nm	Chemical bath deposition
CIGS	2 𝜇m	Coevaporation
Mo	300–400 nm	Sputtering
Soda-lime glass	1 mm	—