Improvement in Device Performance and Reliability of Organic Light-Emitting Diodes through Deposition Rate Control

Table 1

(a) Five different device structures used to investigate the dependence of device performance on deposition rate of ultrathin ETL. Consider (𝑥, 𝑦) = (1.3, 0.03), (1.3, 0.3), (1.3, 1.3), (0.3, 0.3), and (0.03, 0.03) for devices A, B, C, D, and E, respectively. (b) Three different device structures used to investigate the electron injection characteristics on deposition rate of ultrathin ETL. Consider  𝑧=0.03, 0.3, and 1.3 for devices F, G, and H, respectively.

(a)

LiF/Al, 1/100 nm
Bebq2, 5 nm, 𝑦 nm/s
Bebq2, 55 nm, 𝑥 nm/s
NPB, 60 nm
ITO, 80 nm
Glass

(b)

Ca, 150 nm
Bebq2, 5 nm, 𝑧 nm/s
Bebq2, 55 nm, 1.3 nm/s
Ca, 150 nm
Glass