Effects of Hydrogen Plasma on the Electrical Properties of F-Doped ZnO Thin Films and p-i-n 𝜶-Si:H Thin Film Solar Cells

Figure 5

Surface morphology of the FZO thin films (a) as-deposited and etched at different HCl concentrations (b) 0.1%, (c) 0.2%, and (d) 0.5%, respectively.

(a)

(b)

(c)

(d)