Effects of Hydrogen Plasma on the Electrical Properties of F-Doped ZnO Thin Films and p-i-n 𝜶-Si:H Thin Film Solar Cells

Table 1

𝑉_oc value, 𝐽_sc value, and F.F. value of the fabricated amorphous silicon thin film solar cells.

FZO parameters	Abbreviated	𝑉oc (V)	𝐽sc (mA/cm^2)	F.F.	Efficiency (%)
as-deposited	A-FZO	0.855	7.380	0.558	3.52
0.2% HCl	A2-FZO	0.843	8.394	0.585	4.14
0.5% HCl	A5-FZO	0.846	7.942	0.570	3.83
plasma treated	P-A-FZO	0.854	7.692	0.552	3.63
0.2% HCl + plasma treated	P-A2-FZO	0.840	8.764	0.578	4.26
0.5% HCl + plasma treated	P-A5-FZO	0.850	8.109	0.574	3.95