Nanopatterned Silicon Substrate Use in Heterojunction Thin Film Solar Cells Made by Magnetron Sputtering
Figure 1
Flow chart of preparation of NPSiS HJT solar cells; (a) coating monolayer of SiO2 nanospheres on CZ n-type c-Si substrate; (b) using SiO2 nanospheres as etching mask in ICP process to fabricate NPSiS; (c) depositing the p-type a-Si : H thin films and TCO thin films by RF magnetron sputtering.
