Table of Contents Author Guidelines Submit a Manuscript
International Journal of Photoenergy
Volume 2014, Article ID 872849, 5 pages
http://dx.doi.org/10.1155/2014/872849
Research Article

Effect of the CO2/SiH4 Ratio in the p-μc-SiO:H Emitter Layer on the Performance of Crystalline Silicon Heterojunction Solar Cells

1Solar Energy Technology Laboratory, National Electronics and Computer Technology Center, 112 Thailand Science Park, Phahonyothin Road, Klong 1, Klong Luang, Pathumthani 12120, Thailand
2PTT Research & Technology Institute, PTT Public Company Limited, 70 Moo2 Phahonyothin Road, Sanubtup, Wangnoi, Ayutthaya 13170, Thailand

Received 27 November 2013; Revised 3 June 2014; Accepted 4 June 2014; Published 22 June 2014

Academic Editor: Mahmoud M. El-Nahass

Copyright © 2014 Jaran Sritharathikhun et al. This is an open access article distributed under the Creative Commons Attribution License, which permits unrestricted use, distribution, and reproduction in any medium, provided the original work is properly cited.

Linked References

  1. M. Taguchi, A. Terakawa, E. Maruyama, and M. Tanaka, “Obtaining a higher Voc in HIT cells,” Progress in Photovoltaics: Research and Applications, vol. 13, no. 6, pp. 481–488, 2005. View at Publisher · View at Google Scholar · View at Scopus
  2. S. Taira, Y. Yoshimine, T. Baba et al., “Our approaches for achieving HIT solar cells with more than 23% efficiency,” in Proceedings of the European Photovoltaic Solar Energy Conference and Exhibition, Milan, Italy, 2007.
  3. J. Sritharathikhun, C. Banerjee, M. Otsubo et al., “Surface passivation of crystalline and polycrystalline silicon using hydrogenated amorphous silicon oxide film,” Japanese Journal of Applied Physics, vol. 46, no. 6, pp. 3296–3300, 2007. View at Publisher · View at Google Scholar · View at Scopus
  4. J. Sritharathikhun, H. Yamamoto, S. Miyajima, A. Yamada, and M. Konagai, “Optimization of amorphous silicon oxide buffer layer for high-efficiency p-type hydrogenated microcrystalline silicon oxide/n-type crystalline silicon heterojunction solar cells,” Japanese Journal of Applied Physics, vol. 47, no. 11, pp. 8452–8455, 2008. View at Publisher · View at Google Scholar · View at Scopus
  5. T. Mueller, S. Schwertheim, and W. R. Fahrner, “Application of wide-bandgap hydrogenated amorphous silicon oxide layers to heterojunction solar cells for high quality passivation,” in Proceedings of the 33rd IEEE Photovoltaic Specialists Conference (PVSC '08), May 2008. View at Publisher · View at Google Scholar · View at Scopus
  6. H. P. Zhou, D. Y. Wei, S. Xu et al., “Si surface passivation by SiOx:H films deposited by a low-frequency ICP for solar cell applications,” Journal of Physics D: Applied Physics, vol. 45, no. 39, Article ID 395401, 2012. View at Publisher · View at Google Scholar · View at Scopus
  7. H. Fujiwara, T. Kaneko, and M. Kondo, “Application of hydrogenated amorphous silicon oxide layers to c-Si heterojunction solar cells,” Applied Physics Letters, vol. 91, no. 13, Article ID 133508, 2007. View at Publisher · View at Google Scholar · View at Scopus
  8. M. Izzi, M. Tucci, L. Serenelli et al., “Doped SiOx emitter layer in amorphous/crystalline silicon heterojunction solar cell,” Applied Physics A: Materials Science and Processing, vol. 115, no. 2, pp. 705–712, 2014. View at Publisher · View at Google Scholar · View at Scopus
  9. A. Limmanee, T. Sugiura, H. Yamamoto et al., “Boron-doped microcrystalline silicon oxide film for use as back surface field in cast polycrystalline silicon solar cells,” Japanese Journal of Applied Physics, vol. 47, no. 12, pp. 8796–8798, 2008. View at Publisher · View at Google Scholar · View at Scopus
  10. J. Sritharathikhun, F. Jiang, S. Miyajima, A. Yamada, and M. Konagai, “Optimization of p-type hydrogenated microcrystalline silicon oxide window layer for high-efficiency crystalline silicon heterojunction solar cells,” Japanese Journal of Applied Physics, vol. 48, no. 10, pp. 1016031–1016035, 2009. View at Publisher · View at Google Scholar · View at Scopus
  11. D. Das, M. Jana, and A. K. Barua, “Characterization of undoped μc-SiO:H films prepared from (SiH4+CO2+H2)-plasma in RF glow discharge,” Solar Energy Materials and Solar Cells, vol. 63, no. 3, pp. 285–297, 2000. View at Publisher · View at Google Scholar · View at Scopus
  12. M. A. Green, Solar Cells—Operating Principles, Technology and System Applications, Prentice-Hall, Englewood Cliffs, NJ, USA, 1982.
  13. H. Watanabe, K. Haga, and T. Lohner, “Structure of high-photosensitivity silicon-oxygen alloy films,” Journal of Non-Crystalline Solids, vol. 164–166, no. 2, pp. 1085–1088, 1993. View at Publisher · View at Google Scholar · View at Scopus
  14. S. Miyajima, A. Yamada, and M. Konagai, “Highly conductive microcrystalline silicon carbide films deposited by the hot wire cell method and its application to amorphous silicon solar cells,” Thin Solid Films, vol. 430, no. 1-2, pp. 274–277, 2003. View at Publisher · View at Google Scholar · View at Scopus
  15. T. Krajangsang, S. Kasashima, A. Hongsingthong, P. Sichanugrist, and M. Konagai, “Effect of p-μc-Si1−xOx:H layer on performance of hetero-junction microcrystalline silicon solar cells under light concentration,” Current Applied Physics, vol. 12, no. 2, pp. 515–520, 2012. View at Publisher · View at Google Scholar · View at Scopus