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International Journal of Photoenergy
Volume 2015 (2015), Article ID 483147, 8 pages
http://dx.doi.org/10.1155/2015/483147
Research Article

Improving Performance of CIGS Solar Cells by Annealing ITO Thin Films Electrodes

1Department of Photonics Engineering, Yuan Ze University, 135 Yuan-Tung Road, Chungli 320, Taiwan
2Department of Physics, Fu Jen Catholic University, 510 Zhongzheng Road, Xinzhuang District, New Taipei 242, Taiwan

Received 19 July 2015; Revised 11 October 2015; Accepted 22 October 2015

Academic Editor: Elias Stathatos

Copyright © 2015 Chuan Lung Chuang et al. This is an open access article distributed under the Creative Commons Attribution License, which permits unrestricted use, distribution, and reproduction in any medium, provided the original work is properly cited.

Linked References

  1. K. L. Chopra, S. Major, and D. K. Pandya, “Transparent conductors—a status review,” Thin Solid Films, vol. 102, no. 1, pp. 1–46, 1983. View at Publisher · View at Google Scholar · View at Scopus
  2. K. L. Chopra, P. D. Paulson, and V. Dutta, “Thin-film solar cells: an overview,” Progress in Photovoltaics: Research and Applications, vol. 12, no. 2-3, pp. 69–92, 2004. View at Publisher · View at Google Scholar · View at Scopus
  3. T. M. Razykov, C. S. Ferekides, D. Morel, E. Stefanakos, H. S. Ullal, and H. M. Upadhyaya, “Solar photovoltaic electricity: current status and future prospects,” Solar Energy, vol. 85, no. 8, pp. 1580–1608, 2011. View at Publisher · View at Google Scholar · View at Scopus
  4. P. Jackson, D. Hariskos, R. Wuerz et al., “Properties of Cu(In,Ga)Se2 solar cells with new record efficiencies up to 21.7%,” Physica Status Solidi, vol. 9, no. 1, pp. 28–31, 2015. View at Publisher · View at Google Scholar · View at Scopus
  5. Y. Yao, C. Jin, Z. Dong, Z. Sun, and S. M. Huang, “Improvement in performance of GaN-based light-emitting diodes with indium tin oxide based transparent ohmic contacts,” Displays, vol. 28, no. 3, pp. 129–132, 2007. View at Publisher · View at Google Scholar · View at Scopus
  6. S. M. Huang, Y. Yao, C. Jin, Z. Sun, and Z. J. Dong, “Enhancement of the light output of GaN-based light-emitting diodes using surface-textured indium-tin-oxide transparent ohmic contacts,” Displays, vol. 29, no. 3, pp. 254–259, 2008. View at Publisher · View at Google Scholar · View at Scopus
  7. Y.-C. Park, Y.-S. Kim, H.-K. Seo, S. G. Ansari, and H.-S. Shin, “ITO thin films deposited at different oxygen flow rates on Si(100) using the PEMOCVD method,” Surface and Coatings Technology, vol. 161, no. 1, pp. 62–69, 2002. View at Publisher · View at Google Scholar · View at Scopus
  8. A. Suzuki, T. Matsushita, T. Aoki, A. Mori, and M. Okuda, “Highly conducting transparent indium tin oxide films prepared by pulsed laser deposition,” Thin Solid Films, vol. 411, no. 1, pp. 23–27, 2002. View at Publisher · View at Google Scholar · View at Scopus
  9. S. Seki, Y. Sawada, and T. Nishide, “Indium-tin-oxide thin films prepared by dip-coating of indium diacetate monohydroxide and tin dichloride,” Thin Solid Films, vol. 388, no. 1-2, pp. 22–26, 2001. View at Publisher · View at Google Scholar · View at Scopus
  10. D. Kim, Y. Han, J.-S. Cho, and S.-K. Koh, “Low temperature deposition of ITO thin films by ion beam sputtering,” Thin Solid Films, vol. 377-378, pp. 81–86, 2000. View at Publisher · View at Google Scholar · View at Scopus
  11. F. El Akkad, A. Punnoose, and J. Prabu, “Properties of ITO films prepared by rf magnetron sputtering,” Applied Physics A: Materials Science & Processing, vol. 71, no. 2, pp. 157–160, 2000. View at Google Scholar · View at Scopus
  12. A. Luis, C. N. de Carvalho, G. Lavareda, A. Amaral, P. Brogueira, and M. H. Godinho, “ITO coated flexible transparent substrates for liquid crystal based devices,” Vacuum, vol. 64, no. 3-4, pp. 475–479, 2002. View at Publisher · View at Google Scholar · View at Scopus
  13. F. L. Wong, M. K. Fung, S. W. Tong, C. S. Lee, and S. T. Lee, “Flexible organic light-emitting device based on magnetron sputtered indium-tin-oxide on plastic substrate,” Thin Solid Films, vol. 466, no. 1-2, pp. 225–230, 2004. View at Publisher · View at Google Scholar · View at Scopus
  14. D. Kim and S. Kim, “AFM observation of ITO thin films deposited on polycarbonate substrates by sputter type negative metal ion source,” Surface and Coatings Technology, vol. 176, no. 1, pp. 23–29, 2003. View at Publisher · View at Google Scholar · View at Scopus
  15. H.-Y. Yeom, N. Popovich, E. Chason, and D. C. Paine, “A study of the effect of process oxygen on stress evolution in d.c. magnetron-deposited tin-doped indium oxide,” Thin Solid Films, vol. 411, no. 1, pp. 17–22, 2002. View at Publisher · View at Google Scholar · View at Scopus
  16. Y.-S. Kim, Y.-C. Park, S. G. Ansari, J.-Y. Lee, B.-S. Lee, and H.-S. Shin, “Influence of O2 admixture and sputtering pressure on the properties of ITO thin films deposited on PET substrate using RF reactive magnetron sputtering,” Surface and Coatings Technology, vol. 173, no. 2-3, pp. 299–308, 2003. View at Publisher · View at Google Scholar · View at Scopus
  17. T. Seino, T. Sato, and M. Kamei, “650 mm × 830 mm area sputtering deposition using a separated magnet system,” Vacuum, vol. 59, no. 2-3, pp. 431–436, 2000. View at Publisher · View at Google Scholar · View at Scopus
  18. S. J. Nadel, P. Greene, J. Rietzel, and J. Strümpfel, “Equipment, materials and processes: a review of high rate sputtering technology for glass coating,” Thin Solid Films, vol. 442, no. 1-2, pp. 11–14, 2003. View at Publisher · View at Google Scholar · View at Scopus
  19. H. Morikawa and M. Fujita, “Crystallization and electrical property change on the annealing of amorphous indium-oxide and indium-tin-oxide thin films,” Thin Solid Films, vol. 359, no. 1, pp. 61–67, 2000. View at Publisher · View at Google Scholar · View at Scopus
  20. Y. S. Jung, “A spectroscopic ellipsometry study on the variation of the optical constants of tin-doped indium oxide thin films during crystallization,” Solid State Communications, vol. 129, no. 8, pp. 491–495, 2004. View at Publisher · View at Google Scholar · View at Scopus
  21. Y. Hu, X. Diao, C. Wang, W. Hao, and T. Wang, “Effects of heat treatment on properties of ITO films prepared by rf magnetron sputtering,” Vacuum, vol. 75, no. 2, pp. 183–188, 2004. View at Publisher · View at Google Scholar · View at Scopus
  22. J. B. Almeida, “Design of magnetrons for dc sputtering,” Vacuum, vol. 39, no. 7-8, pp. 717–721, 1989. View at Publisher · View at Google Scholar · View at Scopus
  23. F. Kurdesau, G. Khripunov, A. F. da Cunha, M. Kaelin, and A. N. Tiwari, “Comparative study of ITO layers deposited by DC and RF magnetron sputtering at room temperature,” Journal of Non-Crystalline Solids, vol. 352, no. 9–20, pp. 1466–1470, 2006. View at Publisher · View at Google Scholar · View at Scopus
  24. H.-N. Cui, V. Teixeira, L.-J. Meng, R. Martins, and E. Fortunato, “Influence of oxygen/argon pressure ratio on the morphology, optical and electrical properties of ITO thin films deposited at room temperature,” Vacuum, vol. 82, no. 12, pp. 1507–1511, 2008. View at Publisher · View at Google Scholar · View at Scopus
  25. K. J. Kumar, N. R. C. Raju, and A. Subrahmanyam, “Thickness dependent physical and photocatalytic properties of ITO thin films prepared by reactive DC magnetron sputtering,” Applied Surface Science, vol. 257, no. 7, pp. 3075–3080, 2011. View at Publisher · View at Google Scholar · View at Scopus
  26. I. Hamberg and C. G. Granqvist, “Evaporated Sn-doped In2O3 films: basic optical properties and applications to energy-efficient windows,” Journal of Applied Physics, vol. 60, no. 11, pp. R123–R160, 1986. View at Publisher · View at Google Scholar · View at Scopus
  27. S.-I. Jun, T. E. McKnight, M. L. Simpson, and P. D. Rack, “A statistical parameter study of indium tin oxide thin films deposited by radio-frequency sputtering,” Thin Solid Films, vol. 476, no. 1, pp. 59–64, 2005. View at Publisher · View at Google Scholar · View at Scopus
  28. Powder Diffraction File, Joint Committee on Powder Diffraction Standards—International Centre for Diffraction Data, Newtown Square, Pa, USA, Card 06-0416, 1981.
  29. L.-J. Meng and M. P. dos Santos, “Properties of indium tin oxide films prepared by rf reactive magnetron sputtering at different substrate temperature,” Thin Solid Films, vol. 322, no. 1-2, pp. 56–62, 1998. View at Publisher · View at Google Scholar · View at Scopus
  30. H. Ma, J.-S. Cho, and C.-H. Park, “A study of indium tin oxide thin film deposited at low temperature using facing target sputtering system,” Surface and Coatings Technology, vol. 153, no. 2-3, pp. 131–137, 2002. View at Publisher · View at Google Scholar · View at Scopus
  31. C. Guillén and J. Herrero, “Influence of oxygen in the deposition and annealing atmosphere on the characteristics of ITO thin films prepared by sputtering at room temperature,” Vacuum, vol. 80, no. 6, pp. 615–620, 2006. View at Publisher · View at Google Scholar · View at Scopus
  32. L.-J. Meng, A. Maçarico, and R. Martins, “Study of annealed indium tin oxide films prepared by rf reactive magnetron sputtering,” Vacuum, vol. 46, no. 7, pp. 673–680, 1995. View at Publisher · View at Google Scholar · View at Scopus
  33. W.-F. Wu and B.-S. Chiou, “Effect of annealing on electrical and optical properties of RF magnetron sputtered indium tin oxide films,” Applied Surface Science, vol. 68, no. 4, pp. 497–504, 1993. View at Publisher · View at Google Scholar · View at Scopus
  34. I. Fanderlik, Optical Properties of Glass, Elsevier, Amsterdam, The Netherlands, 1983.
  35. L.-J. Meng and M. P. dos Santos, “Structure effect on electrical properties of ITO films prepared by RF reactive magnetron sputtering,” Thin Solid Films, vol. 289, no. 1-2, pp. 65–69, 1996. View at Publisher · View at Google Scholar · View at Scopus
  36. G. Frank and H. Köstlin, “Electrical properties and defect model of tin-doped indium oxide layers,” Applied Physics A, vol. 27, no. 4, pp. 197–206, 1982. View at Publisher · View at Google Scholar · View at Scopus
  37. C. H. L. Weijtens, “Influence of the deposition and anneal temperature on the electrical properties of indium tin oxide,” Journal of the Electrochemical Society, vol. 138, no. 11, pp. 3432–3434, 1991. View at Publisher · View at Google Scholar · View at Scopus
  38. S. Bhagwat and R. P. Howson, “Use of the magnetron-sputtering technique for the control of the properties of indium tin oxide thin films,” Surface and Coatings Technology, vol. 111, no. 2-3, pp. 163–171, 1999. View at Publisher · View at Google Scholar · View at Scopus
  39. Y. Shigesato and D. C. Paine, “Study of the effect of Sn doping on the electronic transport properties of thin film indium oxide,” Applied Physics Letters, vol. 62, no. 11, pp. 1268–1270, 1993. View at Publisher · View at Google Scholar · View at Scopus
  40. S. Kundu and P. K. Biswas, “Synthesis and photoluminescence property of nanostructured sol-gel indium tin oxide film on glass,” Chemical Physics Letters, vol. 414, no. 1–3, pp. 107–110, 2005. View at Publisher · View at Google Scholar · View at Scopus
  41. A. El Hichou, A. Kachouane, J. L. Bubendorff et al., “Effect of substrate temperature on electrical, structural, optical and cathodoluminescent properties of In2O3-Sn thin films prepared by spray pyrolysis,” Thin Solid Films, vol. 458, no. 1-2, pp. 263–268, 2004. View at Publisher · View at Google Scholar · View at Scopus
  42. S.-F. Ren, Z.-Q. Gu, and D. Lu, “Quantum confinement of phonon modes in GaAs quantum dots,” Solid State Communications, vol. 113, no. 5, pp. 273–277, 2000. View at Google Scholar · View at Scopus
  43. Z. Chen, A. Rohatgi, R. O. Bell, and J. P. Kalejs, “Defect passivation in multicrystalline-Si materials by plasma-enhanced chemical vapor deposition of SiO2/SiN coatings,” Applied Physics Letters, vol. 65, no. 16, pp. 2078–2080, 1994. View at Publisher · View at Google Scholar · View at Scopus
  44. C. P. Liu, M. W. Chang, and C. L. Chuang, “Effect of rapid thermal oxidation on structure and photoelectronic properties of silicon oxide in monocrystalline silicon solar cells,” Current Applied Physics, vol. 14, no. 5, pp. 653–658, 2014. View at Publisher · View at Google Scholar · View at Scopus
  45. D.-Y. Lee, H.-H. Lee, J. Y. Ahn et al., “A new back surface passivation stack for thin crystalline silicon solar cells with screen-printed back contacts,” Solar Energy Materials & Solar Cells, vol. 95, no. 1, pp. 26–29, 2011. View at Publisher · View at Google Scholar · View at Scopus
  46. P. Panek, K. Drabczyk, A. Focsa, and A. Slaoui, “A comparative study of SiO2 deposited by PECVD and thermal method as passivation for multicrystalline silicon solar cells,” Materials Science and Engineering B, vol. 165, no. 1-2, pp. 64–66, 2009. View at Publisher · View at Google Scholar · View at Scopus
  47. K. Sharma, B. L. Williams, A. Mittal et al., “Expanding thermal plasma chemical vapour deposition of ZnO:Al layers for cigs solar cells,” International Journal of Photoenergy, vol. 2014, Article ID 253140, 9 pages, 2014. View at Publisher · View at Google Scholar · View at Scopus
  48. S. Kijima and T. Nakada, “High-temperature degradation mechanism of Cu(In,Ga)Se2-based thin film solar cells,” Applied Physics Express, vol. 1, no. 7, Article ID 075002, 2008. View at Publisher · View at Google Scholar · View at Scopus